U.S. Patent Prosecution
for the Advanced Practitioner
Participants will acquire a deeper understanding of the
complexities of U.S. patent prosecution to assist them in
developing patent protection strategies, obtaining enhanced
patent protection and avoiding errors during patent prosecution.
Topics addressed will include:
- Continuation and Divisional Practice, including proposed
USPTO rule changes and strategies for patent prosecution
- Administrative Appellate Practice, including internal
conference practice and the effect on patent term extension
- Patent reexamination and reissue, including post issuance
submission of prior art
- Reinstatement after Abandonment
- Obviousness, and the test for “motivation to combine”
- Rambus and the standards-setting patent disclosure
issue
Schedule
Breakfast 8:30 a.m.
Program 9:00 a.m. - 12:00 p.m.
MONTREAL
- Hilton Montreal Bonaventure
Monday, April 16, 2007
William F. Heinz & Jon E. Holland
Thomas, Kayden, Horstemeyer & Risley LLP (Atlanta)
OTTAWA - Hilton Lac Leamy (Gatineau,
Quebec)
Tuesday, April 17, 2007
William F. Heinz & Jon E. Holland
Thomas, Kayden, Horstemeyer & Risley LLP (Atlanta)
TORONTO - Intercontinental Toronto
Centre
Wednesday, April 18, 2007
Michael J. D’Aurelio & Todd Deveau
Thomas, Kayden, Horstemeyer & Risley LLP (Atlanta)
VANCOUVER - Vancouver Convention &
Exhibition Centre
Thursday, April 19, 2007
Michael J. D’Aurelio & Todd Deveau
Thomas, Kayden, Horstemeyer & Risley LLP (Atlanta)
How to Register
On-line
Fax: please fax the completed registraton
form to (613) 234-0671.
Mail: please mail the completed registration
form with payment to:
Intellectual Property Institute of Canada
60 Queen Street, Suite 606, Ottawa, Ontario K1P 5Y7
Inquiries
education@ipic.ca
(613) 234-0516
Program accredited by the New
York CLE Board as both transitional and non transitional.
This program has been accredited by the Intellectual Property
Law Specialty Committee of the Law Society of Upper Canada
for 2.5 hours towards the professional development requirement
for certification.
Financial aid may be available to attend this event.
